Achievable resolution of nano-rings, fabricated using commonly employed conventional mask based photolithography, is limited by diffraction of light. In this work conventional photolithography is modified to incorporate the phenomenon of surface plasmons to overcome the diffraction limit and thus to fabricate nano rings. Here, an embedded-amplitude mask based surface plasmon lithography is numerically investigated to conceptalize a noval methodology to fabricate the proposed nano-ring structure. Results of FDTD simulation shows sharp transmission peaks at the hole edges which could be recorded using suitable thinned photoresist to obtain nano ring structures.
展开▼
