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Preparation and characterization of nanocomposite Ni-AI2O3 thin films by ultrasonic-electrodeposition technology

机译:超声电沉积技术制备纳米复合Ni-Al2O3薄膜及其表征

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Nanocomposite Ni-A12O3 thin film containing nano-sized A12O3 particles had been grown on steel substrate by ultrasonic-electrodeposited technology. The optimum technological parameters of nanocomposite Ni-A12O3 thin films were obtained by experiments and analysis. X-ray diffraction analysis was utilized to detect the crystalline and amorphous characteristics of Ni-A12O3 thin films. The surface morphology and metallurgical structure were analysed by high resolution transmission electron microscope, and scanning electron microscope. The test results showed that nanocomposite Ni-A12O3 thin films prepared by proper ultrasonic-electrodeposited method consist of nanometer-sized A12O3 particles and nickel grains. And the A12O3 nanoparticles and Ni grains diameters in thin films are about 40nm and 80nm, respectively.
机译:通过超声电沉积技术在钢基底上生长了包含纳米Al 2 O 3颗粒的纳米复合Ni-Al 2 O 3薄膜。通过实验和分析,获得了纳米复合Ni-Al2O3薄膜的最佳工艺参数。利用X射线衍射分析来检测Ni-Al 2 O 3薄膜的晶体和非晶特性。用高分辨率透射电子显微镜和扫描电子显微镜分析了表面形貌和冶金结构。测试结果表明,采用适当的超声电沉积法制备的纳米复合Ni-Al2O3薄膜由纳米级的Al2O3颗粒和镍晶粒组成。薄膜中的Al 2 O 3纳米颗粒和Ni晶粒直径分别为约40nm和80nm。

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