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Manufacturing of large area high mobility AM-TFT backplanes using IGZO rotary sputtering targets

机译:使用IGZO旋转溅射靶材制造大面积高迁移率AM-TFT背板

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IGZO deposition by rotary sputtering targets serves the needs for high-performance, low-manufacturing-cost TFTs. Both, manufacturability of rotary targets and performance of produced TFTs confirm the feasibility and underline the advantages of using rotary technology.
机译:通过旋转溅射靶进行IGZO沉积可满足对高性能,低制造成本的TFT的需求。旋转靶的可制造性和生产的TFT的性能都证实了可行性,并强调了使用旋转技术的优势。

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