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Time sequential evolutions of optically-induced single Shockley stacking faults formed in 4H-SiC epitaxial layers

机译:在4H-SiC外延层中形成的光诱导的单个Shockley堆垛层错的时间顺序演化

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Time-dependent evolutions of single and quadruple Shockley stacking faults (sSSF and 4SSF) in 4° off 4H-SiC epitaxial layers have been investigated. UV illuminations using an Hg-Xe lamp light source generate dissociations of basal plane dislocations (BPDs) into sSSFs whereas for 4SSFs no significant changes in shape occur. Detailed analyses of Photo-luminescence (PL) signals suggest that Si- and C-core partials have different PL spectrum distributions in the wavelength range larger than 750 nm, giving rise to images with different contrasts in PL mappings.
机译:研究了在4H-SiC外延层4°处单个和四个Shockley堆叠断层(sSSF和4SSF)随时间的演化。使用Hg-Xe灯光源进行的紫外线照射会导致基面位错(BPD)分解为sSSF,而对于4SSF则不会发生形状的显着变化。对光致发光(PL)信号的详细分析表明,硅核和C核部分在大于750 nm的波长范围内具有不同的PL光谱分布,从而在PL映射中产生具有不同对比度的图像。

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