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Comparison of trench gate IGBT and CIGBT devices for 3.3kV high power module applications

机译:沟槽栅极IGBT和CIGBT器件在3.3kV大功率模块应用中的比较

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Trench gate MOS controlled devices are more desirable in power modules because their reduced Vce(sat) enables increased output power density. However with increased drift region thickness with voltage rating, there is significant increase in conduction loss in Trench gate IGBT (T-IGBT) due to low plasma density from inherent pnp transistor action. On the other hand a well-designed trench gate MOS-controlled thyristor such as the Trench Cluster Insulated Gate Bipolar Transistor (T-CIGBT) is a drop in solution, which can provide thyristor-like on-state loss without compromising ease of control, turnoff loss and SOA. The T-CIGBT device technology employs controlled thyristor to lower on-state and a unique ‘self-clamping’ of the cathode cell potential to control the saturation current density. The comparison of T-IGBT and T-CIGBT 3.3kV/800A module simulation results in this paper show that T-CIGBT can reduce hard switching total losses and increase the power density of existing IGBT module footprints.
机译:沟槽栅极MOS控制的器件在功率模块中更为可取,因为它们降低的Vce(sat)可以提高输出功率密度。然而,随着漂移区厚度的增加和电压额定值的增加,由于固有的pnp晶体管作用导致的等离子体密度低,沟槽栅极IGBT(T-IGBT)的传导损耗显着增加。另一方面,设计良好的沟槽栅极MOS控制晶闸管(例如Trench Cluster绝缘栅双极晶体管(T-CIGBT))是解决方案中的一个问题,它可以提供类似于晶闸管的导通状态损耗,而不会影响控制的简便性,关断损耗和SOA。 T-CIGBT器件技术采用可控硅来降低导通状态,并采用独特的“自钳位”阴极电池电势来控制饱和电流密度。 T-IGBT和T-CIGBT 3.3kV / 800A模块仿真结果的比较表明,T-CIGBT可以减少硬开关总损耗并增加现有IGBT模块占位面积的功率密度。

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