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Simulation and Experimental Results of a 0.15µm Independent Double Gated CMOS Transistor

机译:0.15μm独立双栅极CMOS晶体管的仿真和实验结果

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Abstract-Independent double gated transistors give better control of the channel and dynamic tradeoff between power and performance. An independent double gated (IDG) FlexFET transistor is simulated using the Silvaco Atlas tool and the results are then compared with the data obtained from experimental devices manufactured by American Semiconductor Inc. (ASI). A reasonable correlation between the simulations and the experimental devices is obtained, following careful calibration of the simulation parameters. The bottom gate control factor (f) (i.e. the ratio of the change in threshold voltage to the change in bottom gate voltage) is observed to be around 0.3. The simulator is calibrated to match the experimental results by changing several parameters.
机译:独立于抽象的双栅极晶体管可更好地控制通道,并在功率和性能之间实现动态折衷。使用Silvaco Atlas工具对独立的双栅极(IDG)FlexFET晶体管进行了仿真,然后将结果与从美国半导体公司(ASI)制造的实验设备获得的数据进行比较。在仔细校准了仿真参数之后,获得了仿真和实验设备之间的合理关联。观察到底栅控制因子(f)(即,阈值电压的变化与底栅电压的变化之比)约为0.3。通过更改几个参数对模拟器进行校准以匹配实验结果。

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