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Research on the photoelectric characteristics of a double barrier structure with quantum dots-quantum well inserted in central well

机译:量子点-量子阱插入中心阱的双势垒结构的光电特性研究

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This paper studies the photoelectric characteristics of a double barrier structure with quantum dots (QD)-quantum well (QW) inserted in central well. It has been shown that the current response of this device is closely bound up with optical intensity and the temperature. Based on a professional simulation tool Crosslight APSYS, after analyzing the device's band diagram and its response of photonic memory effect in I-V characteristic (300k) and C-V characteristic(300k), it has been shown that the current response of this device is closely bound up with optical intensity and the illumination time. Based on a professional simulation tool Crosslight APSYS and the testing software Keithley, we can try to establish small-signal models of the device with the experimental datas in order to understand and apply.
机译:本文研究了用量子点(QD) - Quantum井(QW)的双阻挡结构的光电特性。已经表明,该装置的电流响应与光学强度和温度紧密限制。基于专业仿真工具横灯APSYS,在IV特性(300K)和CV特性(300K)中分析设备的频带图及其对光子存储器效果的响应(300K)后,已经表明该设备的电流响应紧密束缚具有光学强度和照明时间。基于专业仿真工具横灯APSYS和Keitley测试软件,我们可以尝试使用实验数据建立设备的小信号模型,以便理解和应用。

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