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Efficient hardware usage in the mask tapeout flow

机译:遮罩流片流程中的高效硬件使用

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With each new technology node there is an increase in the number of layers requiring Optical Proximity Correction (OPC) and verification. This increases the time spent on the mask tapeout flow which is already a lengthy portion of the production flow. New technology nodes not only have additional layers that require OPC but most critical layers also end up with more complex OPC requirements relative to previous generations slowing the tapeout flow even further. In an effort to maintain acceptable turnaround time (TAT) more hardware resources are added at each node and electronic design automation (EDA) suppliers are pushed to improve the software performance. The more we can parallelize operations within the tapeout flow the more efficient we can be with the use of the CPU resources and drive down the overall TAT. Traditional flows go through several cycles where data is broken up into templates, the templates are distributed to compute farms for processing, pieced back together, and sometimes written to disk before starting the next operation in the tapeout flow. During each of these cycles there are ramp up, ramp down, and input/output (I/O) times that are incurred affecting the efficient use of hardware resources. This paper will explore the advantages of pipelining the templates from one operation to the next in order to minimize these effects.
机译:对于每个新技术节点,需要光学邻近校正(OPC)和验证的层数都在增加。这增加了花费在掩模流延流上的时间,该流已经是生产流的很长的一部分。新技术节点不仅具有需要OPC的附加层,而且相对于前几代,大多数关键层还面临更复杂的OPC要求,从而进一步降低了流片流程。为了维持可接受的周转时间(TAT),在每个节点上添加了更多的硬件资源,并推动了电子设计自动化(EDA)供应商来提高软件性能。我们可以在出带流中并行化操作的越多,使用CPU资源并降低总体TAT的效率就越高。传统流程经历了几个周期,在这些周期中,数据被分解为模板,这些模板被分发到计算场以进行处理,重新拼凑在一起,有时还被写入磁盘,然后再开始流片流程中的下一个操作。在这些周期的每个周期中,都会出现斜坡上升,斜坡下降和输入/输出(I / O)时间,这些时间会影响硬件资源的有效利用。本文将探讨从一个操作到下一个操作流水线模板的优势,以最大程度地减少这些影响。

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