Plasma treatment of polydimethylsiloxane thin films studied by infrared reflection absorption spectroscopy

摘要

Plasma modification of polydimethylsiloxane (PDMS) thin films was studied by means of Fourier-Transform-Infrared-Reflection-Absorption-Spectroscopy. The spin-coated PDMS films (10 nm - 100 nm) were prepared on aluminium coated glass substrates, and their thickness was measured by spectroscopic ellipsometry. The direct plasma treatment is compared with the plasma radiation, only, in argon and hydrogen rf plasmas, respectively. Evolution of IR spectra was monitored, and the changes of PDMS characteristic absorption bands (absorbance, broadening, shifting) as well as the formation of new bands are discussed. In particular, the apperance of new band at 1230 cm~(-1) was observed, and it was identified as LO phonon band of SiO_x. For analysis of the Si-O-Si asymmetrical vibration band the deconvolution of this band was performed using Gaussian peaks.