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2010 IEEE international reliability physics symposium

机译:2010 IEEE国际可靠性物理研讨会

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The following topics are dealt with: pMOSFET, high electron mobility transistors, and heterojunction bipolar transistors; optoelectronics thin films; light emitting diodes; phase change memory devices; dielectric breakdown; magnetic tunnel junction; electromigration; package design; radiation-induced pulse noise; CMOS technology; circuit reliability; industrial fault injection platform; thyristor-based memory cell; flash memory; failure analysis; single metal dual dielectric gate stacks; nanoelectronics; power devices; interconnect electro- and stress-migration; interconnect low-k; high-k gate dielectric; stress-induced leakage current; transistor hot carriers; micromechanical devices; electrostatic discharge; charge trapping NAND flash devices; and other thin film devices.
机译:涉及以下主题:pMOSFET,高电子迁移率晶体管和异质结双极晶体管;光电子薄膜;发光二极管;相变存储器件;介电击穿磁性隧道结;电迁移;包装设计;辐射引起的脉冲噪声; CMOS技术;电路可靠性;工业故障注入平台;基于晶闸管的存储单元;闪存故障分析;单金属双电介质栅叠层;纳米电子学电源设备;互连电迁移和应力迁移;互连低k;高k栅极电介质;应力引起的泄漏电流;晶体管热载流子;微型机械设备;静电放电电荷捕获NAND闪存设备;和其他薄膜设备。

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