electrostatic discharge; failure analysis; flash memories; heterojunction bipolar transistors; high electron mobility transistors; light emitting diodes; micromechanical devices; optoelectronic devices; reliability; thin film devices; charge trapping NAND flash devices; circuit reliability; dielectric breakdown; electromigration; flash memory; high-k gate dielectric; industrial fault injection platform; interconnect low-k; magnetic tunnel junction; nanoelectronics; optoelectronics thin films; pMOSFET; phase change memory devices; power devices; single metal dual dielectric gate stacks; stress-induced leakage current; thyristor-based memory cell; transistor hot carriers;
机译:2010 IEEE国际可靠性物理研讨会(IRPS)
机译:2010 IEEE国际可靠性物理研讨会(IRPS)
机译:2010 IEEE国际可靠性物理研讨会(IRPS)
机译:记下您的日历并开始计划参加,并可能在以下研讨会上发表论文:2010 IEEE国际可靠性物理学研讨会
机译:在基于IEEE 802.15.4的无线传感器网络中增强可靠性
机译:2010年国际戊型肝炎学术研讨会报告韩国首尔
机译:2019 IEEE国际可靠性物理研讨会