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Schottky barrier lowering in 4H-SiC Schottky UV detector

机译:4H-SiC肖特基紫外线检测器中的肖特基势垒降低

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The Schottky barrier lowering in 4H-SiC interdigit Schottky-type UV photodiode is investigated in the presence of a thermally grown oxide layer on the exposed active area. Gain photocurrent is observed and correlated with the presence of the oxide and with the charge traps at the semiconductor/oxide interface. Photo-thermally stimulated current measurements evidenced that interface charge accumulation is optically promoted. Rise and fall photo-current measurements provided the time parameter of the trapping phenomenon.
机译:在暴露的有源区域上存在热生长的氧化物层的情况下,研究了4H-SiC叉指肖特基型UV光电二极管中肖特基势垒的降低。观察到了增益光电流,该光电流与氧化物的存在以及半导体/氧化物界面处的电荷陷阱相关。光热激发的电流测量结果表明,光学促进了界面电荷的积累。上升和下降光电流测量结果提供了捕获现象的时间参数。

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