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Detection of Progressive Transmission Loss Due to Haze with Galileo Mask DUV Transmittance Mapping Based on Non Imaging Optics

机译:基于非成像光学的伽利略蒙版DUV透射图检测由于雾霾引起的渐进透射损耗

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In this paper, we expand on our earlier work1'2 reporting the use of high sensitivity DUV transmission metrology as a means for detection of progressive transmission loss on mask and pellicle surfaces. We also report a use case for incoming reticle qualification based on DUV transmission uniformity.Traditional inspection systems rely on algorithms to locate discrete defects greater than a threshold size (typically > 100nm), or printing a wafer and then looking for repeating defects using wafer inspection and SEM review. These types of defect inspection do not have the ability to detect transmission degradation at the low levels where it begins to impact yield. There are numerous mechanisms for transmission degradation, including haze in its early, thin film form, electric-field induced field migration, and pellicle degradation.During the early development of haze, it behaves as a surface film which reduces 193nm transmission and requires compensation by scanner dose. The film forms in a non-uniform fashion, resulting from non-uniformity of exposure on the pattern side due to varying dose passing through the attenuating layers. As this non-uniformity evolves, there is a gradual loss of wafer critical dimension uniformity (CDU) due to a degradation of the exposure dose homogeneity. Electric-field induced migration also appears to manifest as a non-uniform transmission loss, typically presenting with a radial signature.In this paper we present evidence that a DUV transmission measurement system, Galileo™, is capable of detecting low levels of transmission loss, prior to CDU related yield loss or the appearance of printing defects. Galileo is an advanced DUV transmission metrology system which utilizes a wide-band, incoherent light source and non-imaging optics to achieve sensitivities to transmission changes of less than 0.1%. Due to its very high SNR, it has a fast MAM time of less than 1 sec per point, measuring a full field mask in as little as 30 minutes. A flexible user interface enables users to easily define measurement recipes, threshold sensitivities, and time-based tracking of transmission degradation. The system measures through pellicle under better than class 1 clean air conditions.
机译:在本文中,我们扩展了我们的早期工作1,2,其中报告了使用高灵敏度DUV透射计量学作为检测掩模和防护膜表面渐进式透射损耗的方法。我们还报告了基于DUV透射均匀性的入线标线鉴定的用例。 传统的检查系统依靠算法来定位大于阈值大小(通常> 100nm)的离散缺陷,或者打印晶片,然后使用晶片检查和SEM检查寻找重复的缺陷。这些类型的缺陷检查无法检测低水平的传输退化,从而开始影响良率。有许多传播衰减的机制,包括早期的薄膜状雾度,电场感应的电场迁移和薄膜降解。 在雾度的早期发展过程中,它表现为可降低193nm透射率的表面膜,并需要通过扫描仪剂量进行补偿。膜以不均匀的方式形成,这是由于通过衰减层的剂量变化而导致图案侧的曝光不均匀所致。随着这种不均匀性的发展,由于曝光剂量均匀性的降低,晶圆临界尺寸均匀性(CDU)逐渐降低。电场引起的迁移似乎也表现为不均匀的传输损耗,通常表现为径向特征。 在本文中,我们提供了证据,表明DUV透射测量系统Galileo™能够在CDU相关的产量损失或印刷缺陷出现之前检测出低水平的透射损失。伽利略是一种先进的DUV传输计量系统,它利用宽带,非相干光源和非成像光学器件来实现对传输变化的敏感度小于0.1%。由于其非常高的SNR,它具有每点不到1秒的快速MAM时间,可在短短30分钟内完成全场掩模的测量。灵活的用户界面使用户可以轻松定义测量配方,阈值敏感度以及基于时间的传输质量下降跟踪。该系统在优于1类清洁空气条件下通过薄膜进行测量。

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