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N-Type Diamond Growth by Phosphorus Doping

机译:磷掺杂生长N型金刚石

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Phosphorus doping on (001)-oriented diamond is introduced and compared with results achieved on (111) diamond. Detailed procedures, conditions, doping characteristics, and recent electrical properties of (001) phosphorus-doped diamond films are described. Now the highest mobility is reached to be ~780 cm~2/Vs at room temperature. The carrier compensation ratio, which is still high around 50-80 %, is the most important issues for (001) phosphorus-doped diamond to improve its electrical property. The origin of compensators in phosphorus-doped diamond is investigated, while yet to be identified.Ultraviolet light emitting diode with p-i-n junction structure is also introduced using (001) n-type diamond. A strong UV light emission at around ~240 nm is observed even at room temperature. High performance of diamond UV-LED is demonstrated.
机译:介绍了(001)取向金刚石上的磷掺杂,并将其与(111)金刚石获得的结果进行了比较。描述了(001)掺磷金刚石薄膜的详细程序,条件,掺杂特性和最近的电性能。现在,室温下的最高迁移率达到〜780 cm〜2 / Vs。载流子补偿率仍然很高,约为50-80%,是(001)掺磷金刚石改善其电性能的最重要问题。研究了掺磷金刚石中补偿剂的来源,但尚未确定。 还使用(001)n型金刚石引入了具有p-i-n结结构的紫外线发光二极管。即使在室温下,也能在约240 nm附近观察到强烈的紫外光发射。展示了金刚石UV-LED的高性能。

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