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System Integration of the Utah Electrode Array using a Biocompatible Flip Chip Under Bump Metallization Scheme

机译:凹凸金属化方案下使用生物相容倒装芯片的犹他州电极阵列的系统集成

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The advent of micro and nanotechnologies along with integrated circuit technologies has led to many exciting solutions in medical field. One of the major applications of microsystems is microelectrodes interfacing neurons for large scale in vivo sensing, deep brain stimulation and recording. For biomedical microsystems, material selection is a challenge because biocompatibility has to be considered for implantable electronic devices. We are using flip chip bonding to integrate a signal processing IC to the Utah electrode array (UEA). Conventionally the flip chip process is used to bond a die to a substrate or interposer. In this work the electrical interconnects are made from the under bump metallization (UBM) on the UEA to the solder bumps on the IC. The UBM selection and reliability is one of the critical issues in the total reliability of a flip chip bumping and interconnection technology. The UBM was optimized to achieve improved interconnect strength, and its reliability was evaluated by conducting solder ball shear strength testing. The UBM reliability was tested with two solder metallurgies including AuSn and SnCu0.7. These solders are needed to allow two reflow processes to be used, an initial higher temperature (350°C) and a second lower temperature process (250°C).
机译:微米和纳米技术以及集成电路技术的出现导致了医疗领域中许多令人兴奋的解决方案。微系统的主要应用之一是与神经元接口的微电极,可用于大规模体内感测,深部脑刺激和记录。对于生物医学微系统,材料选择是一个挑战,因为对于植入式电子设备必须考虑生物相容性。我们正在使用倒装芯片键合将信号处理IC集成到犹他州电极阵列(UEA)。常规地,倒装芯片工艺用于将管芯结合到衬底或中介层。在这项工作中,电气互连是由UEA上的凸点下金属化(UBM)到IC上的焊料凸点组成的。 UBM的选择和可靠性是倒装芯片凸点和互连技术的整体可靠性中的关键问题之一。对UBM进行了优化,以提高互连强度,并通过进行焊球剪切强度测试来评估其可靠性。使用包括AuSn和SnCu0.7在内的两种焊料冶金学测试了UBM的可靠性。需要使用这些焊料以允许使用两种回流焊工艺,即初始较高的温度(350°C)和第二种较低温度的工艺(250°C)。

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