The vacancy exchange mechanism was used to model the inter diffusion of Si and Ge in Si/Si1-xGex/Si single quantum well structures. Diffusion was modeled for samples grown by molecular beam epitaxy and annealed at 900degC, 1000degC and 1100degC for different times in inert and oxidizing ambients. Intrinsic self diffusivities of Si and Ge as a function of Ge fraction in the structure used as the fitting parameters match values reported in the literature. Once these parameters were fixed for the inert ambient, the diffusion behavior under oxidizing conditions was completely accounted for by the model with no additional fitting parameters. Excellent fits were obtained in all the cases
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机译:空置交换机制用于在Si / Si 1-x / sub> ge x sub> / si单量子阱结构中模拟Si和Ge的帧间扩散。用于通过分子束外延生长的样品的扩散,并在900degc,1000degc和1100degc在惰性和氧化的环境中退火。 Si和Ge的固有自扩散性作为用于拟合参数的结构中的GE分数的函数,其在文献中报告的价值。一旦将这些参数固定为惰性环境,氧化条件下的扩散行为被模型完全占,没有额外的拟合参数。在所有病例中获得了优异的配合
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