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GaInP2 and GaAs solar cells grown on Si substrate

机译:在硅衬底上生长的GaInP 2 和GaAs太阳能电池

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Large size Si substrates coated with a thin layer of singlecrystal Ge were used to grow GaAs and GaInP2 solar cellsusing MOCVD. Preliminary evaluation indicated: (1) both GaAs and GaInP2 were highly crystalline epi-layers; (2) quantum efficiencyof GaInP2 cell on Si substrate can reach 94% of high qualityGaInP2 on Ge substrate and that of GaAs cell on Si substratecan reach 83.4%; and (3) a 5000 thermal cycle test of temperature rangefrom +170° C to -100° C did not damage the solar cell. Theseresults showed that a properly prepared Ge layer on Si can relax strainand grow a high quality GaInP2 and GaAs solar cell, with apractical efficiency for space application
机译:大型Si衬底涂有一层薄薄的单层 晶体锗用于生长GaAs和GaInP 2 太阳能电池 使用MOCVD。初步评估表明:(1)GaAs和GaInP都 2 是高度结晶的外延层; (2)量子效率 Si衬底上的GaInP 2 单元的质量可以达到高质量的94% Ge衬底上的GaInP 2 和Si衬底上的GaAs电池的GaInP 2 可以达到83.4%; (3)温度范围的5000次热循环测试 从+ 170°C到-100°C的温度不会损坏太阳能电池。这些 结果表明,在Si上正确制备Ge层可以缓解应变 并生长出高质量的GaInP 2 和GaAs太阳能电池 太空应用的实际效率

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