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Temperature-dependence of noise figure of monolithic RF transformers on a thin (20 μm) silicon substrate

机译:薄(20μm)硅基板上的单片RF变压器的噪声系数与温度的关系

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We demonstrate an analysis of the effect of temperature (from -45° C to 175° C) on the quality-factor (Q-factor) and noise figure (NF) performances of monolithic RF transformers on both normal (750 μm) and thin (20 μm) silicon substrates. The results show that silicon substrate thinning is effective in improving the Q-factor and NF performances of transformers. In addition, Q-factors of both primary and secondary coils decrease with increasing temperature but show a reverse behavior within a higher frequency range. The noise figure (NF) increases with increasing temperature. The present analysis enables RF engineers to understand more deeply the NF (i.e. power loss) behavior of RF monolithic transformers fabricated on a silicon substrate, and hence is helpful for them in designing less temperature-sensitive low-supply-voltage transformer-feedback low-noise-amplifiers (LNA) and voltage-controlled-oscillators (VCO), and other radio-frequency integrated circuits (RF-ICs) which include transformers.
机译:我们演示了分析温度(-45°C至175°C)对普通(750μm)和薄型单片RF变压器的质量因子(Q因子)和噪声系数(NF)性能的影响的分析结果(20μm)硅基板。结果表明,硅衬底减薄可有效改善变压器的Q因子和NF性能。此外,初级线圈和次级线圈的Q因子都随温度升高而降低,但在较高的频率范围内表现出相反的行为。噪声系数(NF)随着温度的升高而增加。通过本分析,RF工程师可以更深入地了解在硅基板上制造的RF单片变压器的NF(即功率损耗)行为,从而有助于他们设计对温度敏感度较低的低电源电压变压器反馈低噪声。噪声放大器(LNA)和压控振荡器(VCO),以及其他包含变压器的射频集成电路(RF-IC)。

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