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An extended model for carbon nanotube field-effect transistors

机译:碳纳米管场效应晶体管的扩展模型

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In this paper, we present an extended Schottky barrier model that includes two new crucial aspects: i) current injection from the metal contacts into the channel does not occur directly but is mediated by the segment of the nanotube underneath the metal contacts whose density of states (DOS) is altered through the proximity of the metal (referred to in the following as "metal-modified" nanotube segment); and ii) the energy gap of carbon nanotubes with an average diameter of /spl sim/1.4 nm seems to be rather /spl sim/1.2 eV than /spl sim/0.7 eV as typically assumed for these type of tubes. Our simulation allows us for the first time to quantitatively describe subthreshold characteristics of CNFETs over the entire gate voltage range.
机译:在本文中,我们提出了一个扩展的肖特基势垒模型,该模型包括两个新的关键方面:i)从金属触点注入到沟道中的电流注入不是直接发生的,而是由金属触点下方的碳纳米管的部分介导的,其状态密度(DOS)通过金属(以下称为“金属改性的”纳米管片段)的接近而改变; ii)平均直径为/ spl sim / 1.4 nm的碳纳米管的能隙似乎是/ spl sim / 1.2 eV,而不是通常针对这些类型的管假设的/ spl sim / 0.7 eV。我们的仿真使我们第一次能够在整个栅极电压范围内定量描述CNFET的亚阈值特性。

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