2-D Image Based CDSEM Applications for Thin Film Head Metrology

摘要

Image based metrology has proven to be a robust and valuable technique for process control at the slider fabrication. The major advantage of this technique is that it allows much easier and faster computation time for multiple target analysis in the field of view. CD measurements at the slider level correlate directly to functional parameters on the head, hence the return on investment on such a technique is very high. This technique is also being used in the semiconductor industry for measurement on features like contacts with multiple or weak edges.