首页> 外文会议>Application of Accelerators in Research and Industry >Nonlinear Effect of Carbon Cluster Induced Damage in Silicon
【24h】

Nonlinear Effect of Carbon Cluster Induced Damage in Silicon

机译:碳簇诱导的硅损伤的非线性效应

获取原文

摘要

Carbon clusters C_n for n=l up to 10 were obtained from a SNICS ion source. The clusters with the same velocity were implanted into silicon crystal. We have observed a nonlinear effect on radiation damage of silicon due to the size of the cluster ions. The larger the size of the cluster ions, the larger the radiation damage after normalized with the atomic dosage. The dependence of the damage on the implantation dosage was also studied. The quantitative characterization of the damage was performed by RBS/Channeling analysis and the nonlinear effect in the cluster-solid interaction will be presented.
机译:从SNICS离子源获得n = 1直至10的碳簇C_n。将具有相同速度的簇植入硅晶体中。我们已经观察到由于团簇离子的尺寸而对硅的辐射损伤产生非线性影响。簇离子的尺寸越大,用原子剂量归一化后的辐射损伤越大。还研究了损伤对植入剂量的依赖性。通过RBS /通道分析对损伤进行了定量表征,并将给出团簇-固相相互作用中的非线性效应。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号