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Fabrication of Nd Cr co-doped GGG thin films for a Q-switched waveguide laser by the two-target pulsed KrF laser deposition method

机译:双靶脉冲KrF激光沉积法制备Q开关波导激光器Nd Cr共掺杂GGG薄膜

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Abstract: The Nd$+3$PLU$/,Cr$+4$PLU$/ co-doped GGG epitaxial thin films for self Q-switched waveguide laser has been fabricated by a two-target pulsed laser deposition method. Concentrations of Nd and Cr ion in Nd,Cr:GGG thin films are well adjusted by changing laser ablation fluences independently for Nd:GGG and Cr,Ca:GGG sintered targets. The structure of Nd,Cr:GGG thin films on YAG substrate shows a planar waveguide structure. It is confirmed that Nd$+3$PLU$/ and Cr$+4$PLU$/ ions are optically active as laser active ions and saturable absorbers around 1.06 $mu@m.!6
机译:摘要:采用两靶脉冲激光沉积法制备了Nd ++ 3 $ PLU $ /,Cr $ + 4 $ PLU $ /自掺Q开关波导激光器的共掺杂GGG外延薄膜。通过独立地改变Nd:GGG和Cr,Ca:GGG烧结靶材的激光烧蚀通量,可以很好地调节Nd,Cr:GGG薄膜中Nd和Cr离子的浓度。 YAG衬底上的Nd,Cr:GGG薄膜的结构显示出平面波导结构。可以证实,Nd $ + 3 $ PLU $ /和Cr $ + 4 $ PLU $ /离子具有光学活性,它们是激光活性离子和1.06μmu@m.!6左右的可饱和吸收剂。

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