Electron-beam lithography simulation for mask making: III. Effect of spot size address grid and raster writing strategies on lithography performance with PBS and ZEP-7000

摘要

Abstract: This paper examines, from a modeling perspective, the effects of spot size, data address and raster writing strategy on lithographic performance. Both PBS, the current U.S. standard for mask making, and ZEP 7000, a new, much higher contrast material, will be examined for their impact on lithographic quality. Simulation is used to demonstrate the differences between resists, writing strategies and their implementation. !11