首页> 外文会议>Symposium on ferroelectric thin films >RF MAGNETRON SPUTTERING EPITAXIALLY GROWN (Pb,La)TiO_3 THIN FILMS ON (0001) A1_2O_3 AND (001) SrTiO_3 FOR NONLINEAR OPTICAL APPLICATIONS
【24h】

RF MAGNETRON SPUTTERING EPITAXIALLY GROWN (Pb,La)TiO_3 THIN FILMS ON (0001) A1_2O_3 AND (001) SrTiO_3 FOR NONLINEAR OPTICAL APPLICATIONS

机译:用于非线性光学应用的(0001)A1_2O_3和(001)SrTiO_3射频磁控溅射溅射表观生长的(Pb,La)TiO_3薄膜

获取原文
获取外文期刊封面目录资料

摘要

Ferroelectrics are known to be excellent materials for nonlinear optics. Miniaturization of circuits using these materials requires an optimization of structural and morphological properties of thin films, to minimize optical losses. The first condition is the use of epitaxially grown thin films. The second one is the optimization of the morphological properties, in particular the roughness at the air/film and film/substrate interfaces must be the lowest possible.The aim of this work is to study the effect of the deposition atmosphere on these properties for PLT thin films grown on (0001) Al_2O_3 and (001) SrTiO_3.
机译:众所周知,铁电材料是用于非线性光学的优秀材料。使用这些材料的电路的小型化需要优化薄膜的结构和形态特性,以最大程度地减少光学损耗。第一个条件是使用外延生长的薄膜。第二个是形态学特性的优化,特别是空气/薄膜和薄膜/基材界面的粗糙度必须尽可能低。 这项工作的目的是研究沉积气氛对在(0001)Al_2O_3和(001)SrTiO_3上生长的PLT薄膜的这些性能的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号