Calixarene and Dendrimer as Novel Photoresist Materials

摘要

Negative-working alkaline developable photoresists based on calix[4]-resorcinarene (1) or calixarene dendrimer (2), a cross linker, and a photo acid generator have been developed. Compound 2 was preparedby the condensation of compound 1 with 3, 5-diallyloxybenzylbromide, followed by the removal of allyl groups. The resist consisting of 1 (70wt