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The stress change in passivated Al lines due to the reaction between Ti and Al

机译：Ti和Al之间的反应导致钝化Al线的应力变化

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摘要

The thin film reaction between Ti and Al-0.5

机译：Ti与Al-0.5之间的薄膜反应

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《Symposium on materials reliability in microelectronics》|1998年|p.213-218|共6页
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T.Marieb; A.Mack; J.Lee; M.DiBattista;
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中图分类无线电电子学、电信技术;
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4. The stress change in passivated Al lines due to the reaction between Ti and Al [C] . T.Marieb, A.Mack, J.Lee, Symposium on materials reliability in microelectronics . 1998

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