Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography

摘要

Abstract: In this paper, the principle of two typical i-line ($lambda $EQ 365 nm) and excimer laser ($lambda $EQ 248 nm) uniform illumination optical systems based on Cohler illumination is reviewed, the principle and method of the calculation and simulation of intensity distribution of the illumination system for sub-micron photolithography consisting of aspherical surfaces, non-co-axial surfaces and lens array are put forward, that is ray-tracing based on the Snell theorem and spot diagram. At the same time, a program CALOSD made by us is described, two typical results of calculation and simulation of intensity distribution of illumination optical systems are given.!3