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Electronic properties of microcrystalline silicon

机译:微晶硅的电子性质

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The electronic and optical properties of microcrystalline silicon films prepared by plasma enhanced chemical vapour deposition are investigated with Hall-effect,electrical conductivity,photothermal deflection spectroscopy and photoluminescence measurements.In particular,the influence of the grain size and the crystaline volume fraction on the conductivity,the carrier density and the Hall mobility is investigated in highly doped films.A percolation model is proposed to describe the observed transport dada. Photoluminescence properties were studied in undoped films.It is proposed that the photoluminescence is due to recombination at structural defects similar to those observed in crystalline silicon.
机译:通过霍尔效应,电导率,光热偏转光谱和光致发光测量研究了通过等离子体增强化学气相沉积法制备的微晶硅膜的电子和光学性质。特别是晶粒尺寸和结晶体积分数对电导率的影响在高掺杂薄膜中研究了载流子密度和霍尔迁移率。提出了一种渗滤模型来描述观测到的传输数据。在未掺杂的薄膜中研究了光致发光特性。有人提出,光致发光是由于在结构缺陷上的复合引起的,类似于在晶体硅中观察到的缺陷。

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