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Overlay can be improved by self-calibrated XY measuring instrument: a lattice perspective

机译:自我校准的XY测量仪器可改善覆盖:晶格透视图

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Abstract: Although the traditional method of O/L measurement (relative comparison between two levels) has proved to be a practical and cost effective way of measuring overlays, in the future this method will have to be supplemented by other means that require measurement of feature position in an absolute coordinate system and then comparing the output with the database rather than with some other level the accuracy of which remains to be established. The use of well calibrated Coordinate Measuring Instruments (CMI's) is one way to achieve the desired accuracy. But calibrating CMI's is a chicken-or-egg dilemma; you can't calibrate one without an accurately measured artifact, and you can't make the artifact without a well-calibrated instrument. Or so it seems. Positional self-calibration methods were invented to solve this problem and show great promise. But still there are many subtleties that must be resolved before such methods can be trusted. This paper explains the geometric basis for lattice methods of self-calibration and concludes with a theorem that demonstrates one of the striking difficulties that must be faced when relying on self- calibration algorithms.!11
机译:摘要:尽管事实证明,传统的O / L测量方法(两个级别之间的相对比较)是一种实用且经济高效的测量覆盖层的方法,但是在将来,该方法将不得不通过其他需要对特征进行测量的方法进行补充将其定位在绝对坐标系中,然后将输出结果与数据库进行比较,而不是与其他尚未确定精度的级别进行比较。使用校准良好的坐标测量仪器(CMI's)是获得所需精度的一种方法。但是校准CMI是一个鸡或蛋的难题。如果没有经过精确测量的工件,就无法进行校准;没有经过良好校准的仪器,就无法制造工件。大概是这样。发明了位置自校准方法来解决这个问题并显示出很大的希望。但是在信任这些方法之前,仍然需要解决许多微妙的问题。本文解释了自校准晶格方法的几何基础,并以一个定理作了总结,该定理证明了依靠自校准算法必须面对的重大难题之一!11

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