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Preparation of Ti:sapphire thin films on sapphire substrates by XeCl excimer laser ablation

机译:XeCl准分子激光烧蚀在蓝宝石衬底上制备Ti:蓝宝石薄膜

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Abstract: This work summarized the results of XeCl excimer laserablation deposition procedure of Ti-doped sapphire thinfilms. Three types of targets areutilized-monocrystalline and two different ceramicssynthesized in vacuum and H$-2$/ ambient. The influenceof the target's type in the film quality is studied.The films are investigated by XRD and SEM, as well asby optical methods. Optical emission measurements oflaser ablated plumes are performed. !8
机译:摘要:这项工作总结了掺钛蓝宝石薄膜的XeCl准分子激光烧蚀沉积工艺的结果。使用三种类型的靶材:真空和H $ -2 $ /环境下合成的单晶和两种不同的陶瓷。研究了靶材类型对薄膜质量的影响。采用XRD,SEM,光学方法对薄膜进行了研究。进行激光烧蚀羽流的光发射测量。 !8

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