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>Quantum mechanical characterization of the microscopic structure and nonlinear optical properties of radiation-induced defects in a-SiO2
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Quantum mechanical characterization of the microscopic structure and nonlinear optical properties of radiation-induced defects in a-SiO2
Abstract: We have used ab initio Hartree-Fock theory to characterize the microscopic structure and the nonlinear optical (NLO) properties of the over-coordinated oxygen hole center observed in radiation-exposed SiO$-2$/ films. Our calculations indicate that a proton (H$+$PLU$/) forms a stable bond with a divalent oxygen atom in the Si-O-Si network at an equilibrium r(O-H) approximately equals 1.005 angstrom and also leads to an enhancement in the microscopic NLO response of the local structure by a factor of 4 or more. In the absence of the over-coordinating H$+$PLU$/, the dipole, moment and the second-order NLO response of the Si- O-Si cluster is extremely small. Protonation of a bridging O atom distorts the electron charge cloud in the direction of the O-H bonding and also reduces the gap between the filled and the vacant energy levels. This leads to a substantial increase in the magnitude of the dipole moment vector and the component of the second-order NLO susceptibility along the O-H bond. !10
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机译:摘要:我们使用从头开始的Hartree-Fock理论来表征在辐射暴露的SiO $ -2 $ /薄膜中观察到的过度配位的氧孔中心的微观结构和非线性光学(NLO)特性。我们的计算表明,质子(H $ + $ PLU $ /)与Si-O-Si网络中的二价氧原子在大约等于1.005埃的平衡r(OH)处形成稳定的键,并且还导致了局部结构的微观NLO响应提高了4倍或更多。在没有过度协调的H $ + $ PLU $ /的情况下,Si-O-Si团簇的偶极,矩和二阶NLO响应非常小。桥接的O原子的质子化沿O-H键的方向扭曲了电子电荷云,并且还减小了填充能级和空位能级之间的间隙。这导致沿O-H键的偶极矩矢量的大小和二阶NLO磁化率的分量大大增加。 !10
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