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Determining optical constants of thin film on substrate from transmission and reflection data

机译:根据透射和反射数据确定基板上薄膜的光学常数

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Abstract: A computational method of determining spectral dependencies of optical constants, the refractive index n and the extinction coefficient k, for a thin film on a relatively thick and transparent substrate from measured reflectance and transmittance spectra is presented. While the reflectance R and transmittance T are single-valued functions of n and k, the optical constants are multivalued functions of R and T. Thus over a reasonable area of n-k space there is a number of (n, k) solutions for each measured reflectance-transmittance pair. To find solutions the Newton-Raphson numerical method is used. It is easy to find the (unphysical) solutions for low values of n and then we go step by step along the curve n (as a function of k) to the acceptable physical solution. In this way we avoid the possible jump to the solutions which are due to interferences. From time to time it happens that the starting coordinates are not good estimates of solutions and the numerical method failed. In such cases we use some variation of Monte Carlo method, when acceptable starting coordinates are found by chance in a small neighborhood of the original supposed starting point. The solutions are calculated for all measured frequencies. In order to simulate the role of the finite spectral resolution of the apparatus we smooth n and k by averaging their values at central point and its neighbors, with a reasonable step through the simulated spectral width. The method is applied to the semiconducting $beta@-iron disilicide film on silicon substrate. !9
机译:摘要:提出了一种计算方法,该方法可通过测量反射率和透射率光谱来确定相对厚且透明的基板上的薄膜的光学常数,折射率n和消光系数k的光谱依赖性。反射率R和透射率T是n和k的单值函数,而光学常数是R和T的多值函数。因此,在nk空间的合理区域内,每种测量值都有许多(n,k)个解反射率-透射率对。为了找到解决方案,使用了牛顿-拉夫森数值方法。很容易找到n值低的(非物理)解,然后我们沿着曲线n(作为k的函数)逐步到达可接受的物理解。这样,我们避免了由于干扰而可能跳到解决方案的问题。有时会发生这样的情况,即起始坐标不是解决方案的良好估计,而数值方法却失败了。在这种情况下,当在原始假定起点的一小部分偶然发现可接受的起始坐标时,我们将使用蒙特卡洛方法的某些变体。计算所有测得频率的解。为了模拟设备有限光谱分辨率的作用,我们通过对n和k在中心点及其相邻点处的值进行平均来对n和k进行平滑处理,并在模拟的光谱宽度内进行合理的调整。该方法适用于硅衬底上的半导体β-二硅化铁薄膜。 !9

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