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Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems

机译:PAC结构和抗蚀剂形态对正性光刻胶系统表面抑制控制的影响

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Abstract: The influence of PAC structure and morphology on the surface induction in novolak based resist systems was investigated. Variation in surface induction for a given PAC is caused by changes in the morphology between the surface and the bulk of the resist film resulting from solvent depletion and is characteristic of the novolak. PAC structure, particularly its functionality $LB@i.e., maximum amount of diazonaphthoqunione (DNQ) esterifiable OH$RB@, was found to greatly influence the amount of surface inhibition. !11
机译:摘要:研究了酚醛清漆基抗蚀剂体系中PAC的结构和形貌对表面感应的影响。对于给定的PAC,表面感应的变化是由于溶剂耗尽导致的抗蚀剂膜表面与主体之间的形貌变化引起的,并且是酚醛清漆的特征。发现PAC的结构,特别是其官能度$ LB @,即最大量的重氮萘醌(DNQ)可酯化的OH $ RB @,极大地影响了表面抑制量。 !11

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