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InAlAs/InGaAs MSM PDs heteroepitaxially grown on Si

机译:在硅上异质外延生长的InAlAs / InGaAs MSM PD

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To study the performance and reproducibility of photodiodes (PDs) on Si in the long-wavelength region, InAlAs/InGaAs metal-semiconductor-metal (MSM) PDs were fabricated on high-quality heteroepitaxial InP layers on Si substrates. The PDs showed dark currents of 0.5-2/spl times/10/sup -8/ A and responsivity of 0.05-0.15 A/W at the bias voltage of 5 V. These DC characteristics are similar to those of devices on InP substrates, The PDs on Si had pulse responses with rise times of 30-70 ps, fall times of 300-500 ps and full widths at half maximum of 150-400 ps.
机译:为了研究长波长区域Si上光电二极管(PD)的性能和可再现性,在Si衬底上的高质量异质外延InP层上制造了InAlAs / InGaAs金属-半导体-金属(MSM)PD。 PD在5 V偏置电压下表现出0.5-2 / spl乘以/ 10sup -8 / A的暗电流和0.05-0.15 A / W的响应度。这些DC特性与InP衬底上的器件相似, Si上的PD具有脉冲响应,其上升时间为30-70 ps,下降时间为300-500 ps,最大宽度为150-400 ps的一半。

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