首页> 外文会议>Electronic Components and Technology Conference, 1992. Proceedings., 42nd >An eutectic bonding technology at a temperature below the eutectic point
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An eutectic bonding technology at a temperature below the eutectic point

机译:温度低于共晶点的共晶键合技术

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The authors report a technique which needs only 240 degrees C to produce nearly eutectic Au-Sn bonding. After bonding, the device can take a postprocessing temperature of 250 degrees C without bonding degradation. The bonding medium consists of Au-Sn multilayer composite deposited directly on the object to be bonded. This technology also eliminates the preforms, reduces tin oxidation, and provides good control of bonding layer thickness. Results of bonding 2 mm*3 mm GaAs dice show that high-quality bondings are obtained, as evaluated by a scanning acoustic microscope. The specimens underwent 40 cycles of thermal shock test between -196 degrees C and 160 degrees C without bonding degradation and die cracking. Scanning electron microscopy and energy-dispersive X-ray studies reveal interesting characteristics of the bonding process. Melting point tests confirm that the bonding layer indeed has a melting temperature of 280 degrees C, higher than the 240 degrees C process temperature.
机译:作者报告了仅需240摄氏度即可产生几乎共晶的Au-Sn键的技术。粘合后,该器件可以承受250摄氏度的后处理温度,而不会降低粘合力。粘结介质由直接沉积在待粘结物体上的Au-Sn多层复合材料组成。该技术还消除了预成型坯,减少了锡的氧化,并提供了对粘合层厚度的良好控制。结合2mm×3mm GaAs管芯的结果表明,如通过扫描声显微镜所评估的,获得了高质量的结合。样品在-196摄氏度和160摄氏度之间经历了40次热冲击测试,并且没有粘结降解和模头破裂。扫描电子显微镜和能量色散X射线研究揭示了键合过程的有趣特征。熔点测试证实,粘合层确实具有280摄氏度的熔融温度,高于240摄氏度的加工温度。

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