Double patterning lithography friendly detailed routing with redundant via consideration

摘要

In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm may not be enough to achieve high quality solution for DPL-unfriendly designs, due to complex 2D patterns in lower metal layers. Therefore, DPL-friendliness is needed at routing stage. Another key yield improvement technique is redundant via insertion. However, this would increase the complexity in DPL-compliance. To make designs manufacturable in DPL, we should not insert a redundant via if it results in coloring conflict. This paper is the first work to consider DPL and redundant via together. We have developed two algorithms, post-routing DPL-aware insertion and DPL-friendly routing with redundant via consideration to take into account redundant via DPL-compliance. Experimental results show that, compared to a DPL-aware optimization flow without redundant via consideration, we can improve insertion rate by 43% while still achieving zero coloring conflicts. Moreover, we can reduce the number of vias and stitches by 9% and 17% respectively.