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Step Coverage Improvement for Electromagnetic Interference (EMI) Shield Film by Forming Bevel-Shaped Packages

机译:通过形成斜角包装来改善电磁干扰(EMI)屏蔽膜的台阶覆盖率

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Package-level conformal EMI shielding has been adopted for several packages such as memory, wireless, and radio frequency in mobile devices. Both the sidewalls and top surface of these packages must be coated with a conductive thin film as a shielding material. We propose improving metal coverage on package sidewalls for a more cost-effective EMI shielding process. The effects of bevel-shaped sidewalls on sidewall coverage compared to conventional straight sidewalls were demonstrated in this study. A bevel angle of 45° showed nearly 100% coverage while a 60° angle showed 89% coverage. Compared to the current straight sidewall package, coverage was four times higher with the same gap between packages (0.25 mm) using a 75° bevel angle. Two cost-effective conformal shielding processes using bevel-shaped sidewalls were proposed. One is an "All-in-one" process where dicing and sputtering are performed using the same frame. The other is a "Small-gap-array" process that provides higher productivity by mounting more packages with smaller gaps between them.
机译:封装级别的共形EMI屏蔽已用于多种封装,例如移动设备中的内存,无线和射频。这些包装的侧壁和顶面都必须涂覆导电薄膜作为屏蔽材料。我们建议改善封装侧壁上的金属覆盖率,以实现更具成本效益的EMI屏蔽工艺。在这项研究中证明了与常规的笔直侧壁相比,斜角形侧壁对侧壁覆盖率的影响。 45°的斜角显示了近100%的覆盖率,而60°的角度显示了89%的覆盖率。与目前的直侧壁封装相比,在使用75°斜角的封装之间具有相同间隙(0.25毫米)的情况下,覆盖率要高四倍。提出了两种使用斜面形侧壁的具有成本效益的保形屏蔽工艺。一种是“多合一”工艺,其中使用同一框架执行切割和溅射。另一个是“小间隙阵列”工艺,它通过安装更多的封装且它们之间的间隙较小而提供了更高的生产率。

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