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Performance enhancement of quantum dot infrared photodetector by periodic pillar array

机译:周期性柱阵列增强量子点红外光电探测器的性能

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In this paper, we report enhanced performance of quantum dot infrared photodetector (QDIP) by means of surface plasmonic structure. A 10-layer InGaAs quantum dot (QD) structure with AlGaAs barriers were grown on GaAs(001) substrate by molecular beam epitaxy. A periodic gold pillar array was fabricated on the surface of the top contact layer by i-line lithography and ICP dry etching. The wafer was processed to form a circular mesa of 300 μm diameter. The pillar pitch was varied from 2.0 to 2.5 μm and the pillar diameter was varied from 1.1 to 1.6 μm. The detectors were illuminated from substrate side to evaluate spectral responsivity and detectivity D* at temperature T= 78 K. The pillar array was found to enhance the detector performance at particular wavelength which depends on the pillar property. We found the optimal property of the pillar array whose enhancement peak matches the QDIP's response peak at 7.7 μm. At that wavelength, the responsivity and detectivity were almost doubled compared to the detector without the pillar array.
机译:在本文中,我们报告了通过表面等离子体激元结构增强的量子点红外光电探测器(QDIP)的性能。通过分子束外延在GaAs(001)衬底上生长具有AlGaAs势垒的10层InGaAs量子点(QD)结构。通过i-线光刻和ICP干法蚀刻在顶部接触层的表面上制备周期性的金柱阵列。加工晶片以形成直径为300μm的圆形台面。柱间距在2.0至2.5μm之间变化,并且柱直径在1.1至1.6μm之间变化。从基板一侧照亮检测器,以评估温度T = 78 K时的光谱响应度和检测度D *。发现柱阵列可以增强特定波长下的检测器性能,具体取决于柱的特性。我们发现了其增强峰与7.7μm处的QDIP响应峰相匹配的柱阵列的最佳性能。与没有柱阵列的检测器相比,在该波长下,响应度和检测率几乎翻了一番。

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