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A Comprehensive and Critical Overview of the Kink Effect in S22 for HEMT Technology

机译:HEMT技术的S 22 的扭结效应的综合和批判性概述

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This invited contribution is aimed at presenting a thorough knowledge, a critical understanding, and new insights into the kink effect in the output reflection coefficient (S22) of field-effect transistors (FETs). To accomplish this challenging goal, we report a measurement-based investigation, using the high-electron-mobility transistor (HEMT) technology as a case study. The kink effect is investigated over a wide range of operating conditions, by changing bias point, ambient temperature, device size, and semiconductor technology. The origin of the kink phenomenon and its dependency on the operating condition are analyzed by using a lumped-element equivalent-circuit model. The achieved findings represent a powerful know-how to entitle microwave engineers to take properly the kink effect into account in fabrication, modeling, and design phases.
机译:这项受邀的贡献旨在提供透彻的知识,重要的理解和对输出反射系数(S的纽结效应)的新见解。 22 )的场效应晶体管(FET)。为了实现这一具有挑战性的目标,我们报告了一项基于测量的调查,以高电子迁移率晶体管(HEMT)技术为例。通过改变偏置点,环境温度,器件尺寸和半导体技术,可以在广泛的工作条件下研究扭结效应。通过使用集总元件等效电路模型分析了扭结现象的起源及其对工作条件的依赖性。所获得的发现代表了强大的专业技能,使微波工程师有权在制造,建模和设计阶段适当考虑扭结效应。

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