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Total Ionizing Dose and Radiation Particle Strike Analysis of Nanoscale FinFET Devices and Circuits

机译:纳米尺度FinFET器件和电路的总电离剂量和辐射颗粒打击分析

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The proposed work investigates the operational robustness and design reliability of 2D and 3D structures of the designed nano-scale devices and circuits, when irradiated by high-energy particles. The TID analysis are performed on 22nm FinFET devices, which is generated by using GDS2MESH tool. The paper presents a methodology for particle strike simulation to understand the ionization charge distribution and identify the vulnerable nodes in the 3D structure of a 22nm FinFET SRAM circuit by varying the Linear Energy Transfer (LET) values from 10MeV to 200Mev. This study is useful in validating the physical structure of a circuit in mitigating the effects of particle strike. In case of memory cell the vulnerable nodes are identified and guarded to isolate the charge distribution due to ionization.
机译:当由高能粒子照射时,拟议的工作调查了所设计的纳米尺度装置和电路的2D和3D结构的操作稳健和设计可靠性。在22nm FinFET设备上执行TID分析,该设备是通过使用GDS2MESH工具而生成的。本文提出了一种用于通过改变10MEV到200MEV的线性能量传递(Let)值来了解电离电荷分布并识别电离电荷分布并识别22nm FinFET SRAM电路的3D结构中的易受攻击节点。该研究可用于验证缓解粒子撞击效果的电路的物理结构。在存储器单元的情况下,识别易受攻击的节点并保护以将引起的电离分布隔离。

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