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Design Considerations of GaN GIT Devices for High Speed Power Switching Applications

机译:用于高速电源开关应用的GaN GIT器件的设计注意事项

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This paper designed and optimized Gallium nitride (GaN) GIT (gate-injection-transistor) devices for power switching applications. We proposed three kinds of structures namely gate insulator (SiNx), field plate and AlGaN buffer to improve GaN GIT devices' switching speed. The results of TCAD simulation indicated that all the three structures can effectively alter GaN GIT devices' turn-on time (ton) or turn-off time (toff). The smallestton and toff were identified as 0.58 ns and 0.59 ns respectively, when we introduced the specific structures into the devices. The GaN GIT device with gate insulator and AlGaN buffer (Al component of 0.25) was identified as the optimal structure design, which had small ton (0.76 ns) and small toff (0.59 ns) at the same time. For the device with the optimal structure, ton and toff were only 63% and 52% of the recorded results for GaN power switching devices, respectively.
机译:本文设计并优化了用于功率开关应用的氮化镓(GaN)GIT(栅极注入晶体管)器件。我们提出了三种结构,即栅极绝缘体(SiN x ),场板和AlGaN缓冲器,以提高GaN GIT器件的开关速度。 TCAD仿真的结果表明,这三种结构都可以有效地改变GaN GIT器件的开启时间(t )或关闭时间(t 关闭 )。最小的 和T 关闭 当我们将特定结构引入器件时,它们分别被标识为0.58 ns和0.59 ns。具有栅绝缘体和AlGaN缓冲层(Al成分为0.25)的GaN GIT器件被认为是最佳的结构设计,其t很小 (0.76 ns)和小t 关闭 (0.59 ns)同时进行。对于具有最佳结构的设备,t 和T 关闭 分别仅为GaN功率开关器件记录结果的63%和52%。

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