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Extraction of BSIM3v3 Junction Capacitance Model of NMOSFET in VLSI Devices,Circuits and Systems

机译:VLSI器件,电路和系统中NMOSFET的BSIM3v3结电容模型的提取

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摘要

An extraction methodology and modeling of BSIM3v3 junction capacitance of NMOSFET in VLSI is proposed. In this paper, the extraction can lead to an improved accuracy on p-n junction capacitance. This methodology can extract parasitic capacitance due to bottom area junction and side-wall capacitance components at the field oxide side and gate oxide side. The capacitance model parameters in BSIM3v3 are proposed also. The manual calculation was used for the extraction methodology. A comparison is made to checking the accuracy of the capacitance models. The results show that a good agreement was found.
机译:提出了VLSI中NMOSFET的BSIM3v3结电容的提取方法和建模。在本文中,提取可以提高p-n结电容的精度。由于底部区域结和场氧化物侧和栅极氧化物侧的侧壁电容分量,这种方法可以提取寄生电容。还提出了BSIM3v3中的电容模型参数。手动计算用于提取方法。进行比较以检查电容模型的准确性。结果表明找到了很好的协议。

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