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Characterization and Electrical Modeling Including Trapping Effects of AIN/GaN HEMT 4×50μm on Silicon Substrate

机译:硅衬底上AIN / GaN HEMT 4×50μm的俘获效应的表征和电学建模

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This paper reports the full characterization and modeling of novel AlN/GaN HEMTs on silicon using a short gate length. This device has been optimized for high frequency analog circuits applications. The presented model includes DC and small-signal modeling steps taking into account the trapping effects. It contains a trap model inside the current source which allows to accurately predict gate-lag transient response and low frequency dispersion of the output admittance. The model is validated by comparing the 4 GHz load-pull measurement results with the simulation ones.
机译:本文报道了使用短栅极长度在硅上的新型AlN / GaN HEMT的完整表征和建模。该器件已针对高频模拟电路应用进行了优化。提出的模型包括DC和小信号建模步骤,并考虑了陷阱效应。它在电流源内部包含一个陷阱模型,该模型可以准确预测栅极滞后瞬态响应和输出导纳的低频色散。通过将4 GHz负载拉力测量结果与仿真结果进行比较来验证该模型。

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