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Simulation The Content Of Indium Of GaN-based LEDs On Patterned Substrate

机译:在图案化衬底上模拟GaN基LED的铟含量

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The GaN-based LEDs have been epitaxial growth on the patterned sapphire substrate by LP-MOCVD. The structure and characters of the samples are analyzed by high-resolution double crystal X-ray diffraction (DCXRD) and photoluminescence (PL). It can be concluded that the crystalline quality of InGaN/GaN multiple quantum wells (MQWs) is preferable, the interface of MQWs is flat, and the yellow luminescence is nearly invisible. Meanwhile, The well thickness, barrier thickness and the content of Indium in the multiple quantum wells are simulated, and the result is consistent with the designed.
机译:GaN-LED已通过LP-MOCVD在图案化的蓝宝石衬底上外延生长。样品的结构和特征通过高分辨率双晶X射线衍射(DCXRD)和光致发光(PL)进行分析。可以得出结论,InGaN / GaN多量子阱(MQWs)的晶体质量较好,MQWs的界面平坦,黄色发光几乎不可见。同时,对多个量子阱中的阱厚度,势垒厚度和铟含量进行了模拟,结果与设计吻合。

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