Bessel decomposition of temperature profiles in film deposition reactors

摘要

Thermal fields in film deposition chambers critically control the final uniformity of the film thickness in semiconductor manufacturing. Constructing simple, efficient and yet accurate enough models of the temperature fields is therefore crucial in effective fault detection and eventually, for film thickness uniformity controls. We explored one decomposition method of the temperature fields using zeroth order Bessel function of the first kind for applications of fault detection and classification.