首页> 外文会议>International Workshop on Active-Matrix Flatpanel Displays and Devices >Ultrafine intrinsic FET with nanodot type floating gate
【24h】

Ultrafine intrinsic FET with nanodot type floating gate

机译:具有纳米点型浮栅的超细本征FET

获取原文

摘要

The channel length of the next generation semiconductor device is 10 nm or less. In general, a pn junction is necessary for FETs, but it is difficult to make the p-n junction to 10 nm or less depending on the concentration gradient relationship. Further, variations in the impurity concentration between the devices cause a problem. For this reason, FETs using intrinsic semiconductors for the channel have been studied. In this study, we investigated the electrical characteristics of n-i-n, p-i-p type FET with channel less than 10 nm by accumulating electric charge in nanoparticles (NP). For a transistor with a channel length of 10 nm or less, a V-groove type FET was used. In addition, NPs were placed at the bottom of the V-groove using a Bio Nano Process (BNP). The protein used is a cage shaped protein called ferritin, which can convert various inorganic materials into nanoparticles. NPs act as a boating gate for this device. Memory operation was confirmed with devices with NPs. We observed that the threshold voltage of the device varied due to the work function of the nanoparticles. This device with well controlled nanostructures is believed to reveal further electronic properties in the region below 10 nm.
机译:下一代半导体器件的沟道长度为10nm或更小。通常,对于FET而言,pn结是必需的,但是根据浓度梯度关系,难以使p-n结达到10nm以下。此外,器件之间的杂质浓度的变化会引起问题。因此,已经研究了将本征半导体用于沟道的FET。在这项研究中,我们通过在纳米粒子(NP)中积累电荷,研究了沟道小于10 nm的n-i-n,p-i-p型FET的电学特性。对于沟道长度为10nm或更小的晶体管,使用了V型沟槽型FET。此外,使用生物纳米工艺(BNP)将NP放置在V型槽的底部。所使用的蛋白质是一种称为铁蛋白的笼状蛋白质,可以将各种无机物质转化为纳米粒子。 NP充当此设备的划船门。已使用具有NP的设备确认了内存操作。我们观察到器件的阈值电压由于纳米颗粒的功函数而变化。据信具有良好控制的纳米结构的该器件在低于10 nm的区域中显示出进一步的电子性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号