2-based RRAM with 1T1R structure are investigated. TID-induced leak'/>
Radiation effects; Computer architecture; Hafnium compounds; Microprocessors; Transistors; Lasers; Leakage currents;
机译:在软击穿状态下基于Al
机译:ZrO
机译:双层HFO
机译:辐射效应1 MB HFO
机译:质子辐射对基于HfO2的RRAM的影响
机译:通过电检测磁共振研究TiN / Ti / HfO2 / TiN电阻性随机存取存储器的总电离剂量效应
机译:四层石墨烯纳米片与具有不对称Al