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Omnidirectional Anti-reflection Properties of Vertically Align SiO_2 Nanorod Films Prepared by Electron Beam Evaporation with Glancing Angle Deposition

机译:通过透明角沉积通过电子束蒸发制备的垂直对准SiO_2纳米棒膜的全向抗反射性能

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Omnidirectional anti-reflection coating nanostructure film have attracted enormous attention for the developments of the optical coating, lenses, light emitting diode, display and photovoltaic. However, fabricated of the omnidirectional antireflection nanostructure film on glass substrate in large area was a challenge topic. In the past two decades, the invention of glancing angle deposition technique as a growth of well-controlled two and three-dimensional morphologies has gained significant attention because of it is simple, fast, cost-effective and high mass production capability. In this present work, the omnidirectional anti-reflection nanostructure coating namely silicon dioxide (SiO_2) nanorods has been investigated for optimized high transparent layer at all light incident angle. The SiO_2 nanorod films of an optimally low refractive index have been fabricated by electron beam evaporation with the glancing angle deposition technique. The morphological of the prepared sampled were characterized by field-emission scanning electron microscope (FE-SEM) and high-resolution transmission electron microscope (HRTEM). The optical transmission and omnidirectional property of the SiO_2 nanorod films were investigated by UV-Vis-NIR spectrophotometer. The measurement were performed at normal incident angle and a full spectral range of 200 - 2000 nm. The angle dependent transmission measure were investigated by rotating the specimen, with incidence angle defined relative to the surface normal of the prepared samples. The morphological characterization results showed that when the glancing angle deposition technique was applied, the vertically align SiO_2 nanorods with partially isolated columnar structure can be constructed due to the enhanced shadowing and limited addtom diffusion effect. The average transmission of the vertically align SiO_2 nanorods were higher than the glass substrate reference sample over the visible wavelength range at all incident angle due to the
机译:全向抗反射涂层纳米结构薄膜已引起极大关注的光学涂层,透镜,发光二极管,显示器和光伏的发展。然而,所制造的全向抗反射纳米结构薄膜的玻璃基板上的大面积是一个挑战主题。在过去的二十年中,掠射角沉积技术,以及控制两个三维形态的生长的本发明已经获得了,因为它显著注意的是简单,快速,成本有效和高批量生产能力。在该目前的工作中,所述全向抗反射纳米结构即涂覆二氧化硅(SiO_2)纳米棒已在所有光入射角研究用于优化的高透明层。一个最佳的低折射率的纳米棒SiO_2膜已经通过与掠射角沉积技术电子束蒸发制成。通过场发射扫描电子显微镜(FE-SEM)和高分辨透射电子显微镜(HRTEM)的制备采样的形态进行了表征。的SiO_2纳米棒膜的光学传输和全向性能进行了通过UV-Vis-NIR分光光度计分析。 2000纳米 - 测量物在正常的入射角和为200的全光谱范围内进行。依赖角度的传输量度分别通过转动样品的调查,相对于表面法线的制备的样品的定义入射角。形态学表征结果表明,当施加掠射角沉积技术,与部分地隔离柱状结构的垂直对齐SiO_2纳米棒可构造由于增强阴影和有限addtom扩散效果。垂直对齐SiO_2纳米棒的平均发送由于是在所有入射角不是通过可见光波长范围内的玻璃基板参考样品更高

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