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Impact of Vth shift on Ron in E/D-mode GaN-on-Si power transistors: Role of dynamic stress and gate overdrive

机译:Vth漂移对E / D模式GaN-on-Si功率晶体管中Ron的影响:动态应力和栅极过驱动的作用

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In this work, we revealed the impacts of VTH shift on RON in enhancement-/depletion-mode (E/D-mode) GaN transistors under dynamic AC (1 k-1 MHz) stress. With newly developed fast dynamic characterization techniques, we achieved data acquisition within 120 ns after each stress pulse throughout the entire stress time ranging from 10-7 s up to 103 s. VTH shift and the consequent RON increase under dynamic stress, which are more relevant to high-frequency switching operation, exhibits frequency dependence and is smaller than that under conventionally used static stress. Furthermore, distinctive RON's susceptibilities to VTH shift between E-mode and D-mode GaN transistors are revealed and analyzed. The correlation between VTH shift and RON facilitates the assessment on how much VTH shift a GaN power switch can tolerate.
机译:在这项工作中,我们揭示了在动态AC(1 k-1 MHz)应力下,增强/耗尽模式(E / D模式)GaN晶体管中VTH偏移对RON的影响。借助最新开发的快速动态特征技术,我们在整个应力时间内(从10-7 s到103 s)的每个应力脉冲之后的120 ns内实现了数据采集。在动态应力下,VTH偏移和随之而来的RON增加与高频开关操作更相关,表现出频率依赖性,并且比常规使用的静态应力下的值小。此外,揭示并分析了RON对E型和D型GaN晶体管之间VTH漂移的敏感性。 VTH偏移和RON之间的相关性有助于评估GaN电源开关可以承受的VTH偏移量。

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