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On the problems of stability and durability of field-emission current sources for electrovacuum devices

机译:关于电真空器件场发射电流源的稳定性和耐久性问题

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The results of the practical implementation of the concept of field-emission current source with high average current density of 0.1-0.3 A·cm~(-2) are shown. The durability of cathode samples at a level of 6000 hours is achieved under conditions of technical vacuum. A phenomenological model is suggested that describes the tunneling of both equilibrium and nonequilibrium electrons in a vacuum from the zone of concentration of electrostatic field. Conditions are discussed as the resulting increase in the emission current due to the connection mechanism of the photoelectric effect is thermodynamically favorable, that is not accompanied by an undesirable increase in the temperature of the local emission zone. It is shown that to ensure stability and durability of the cathode is also important to limit the concentration of equilibrium carriers using composite structures «DLC film on Mo substrate." This helps to reduce the criticality of the CVC. A possible alternative is to use a restrictive resistance in the cathode. However, this increases the heat losses and thus decreases assembly efficiency. The results of experimental studies of the structure showing the saturation of photoemission current component with an increase in operating voltage. This fact suggests the existence of an effective mechanism for control of emission at constant operating voltage. This is fundamentally important for the stabilization of field emission cathode, providing a reliability and durability. The single-photon processes and the small thickness DLC films (15-20 nm) provide high-speed process of control.
机译:给出了实际实现高平均电流密度为0.1-0.3 A·cm〜(-2)的场发射电流源概念的结果。在技​​术真空条件下,阴极样品的耐久性达到了6000小时。提出了一种现象学模型,该模型描述了真空中静电场集中区域中平衡电子和非平衡电子的隧穿。讨论了条件,因为由于光电效应的连接机理而导致的发射电流的增加在热力学上是有利的,而不伴随局部发射区的温度的不期望的增加。结果表明,确保阴极的稳定性和耐用性对于使用复合结构«Mo衬底上的DLC膜来限制平衡载流子的浓度也很重要。这有助于降低CVC的临界性。一种可能的替代方法是使用CVC。阴极上的限制电阻,但是,这增加了热损失,从而降低了组装效率;结构的实验研究结果表明,随着工作电压的增加,光发射电流分量达到饱和,这一事实表明存在有效的机理用于控制恒定工作电压下的发射,这对于稳定场发射阴极,提供可靠性和耐用性至关重要,单光子工艺和小厚度DLC膜(15-20 nm)提供了高速工艺。控制。

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