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On the problems of stability and durability of field-emission current sources for electrovacuum devices

机译:关于电气扫描装置现场排放电流源的稳定性及耐久性问题

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The results of the practical implementation of the concept of field-emission current source with high average current density of 0.1-0.3 A·cm~(-2) are shown. The durability of cathode samples at a level of 6000 hours is achieved under conditions of technical vacuum. A phenomenological model is suggested that describes the tunneling of both equilibrium and nonequilibrium electrons in a vacuum from the zone of concentration of electrostatic field. Conditions are discussed as the resulting increase in the emission current due to the connection mechanism of the photoelectric effect is thermodynamically favorable, that is not accompanied by an undesirable increase in the temperature of the local emission zone. It is shown that to ensure stability and durability of the cathode is also important to limit the concentration of equilibrium carriers using composite structures ?DLC film on Mo substrate." This helps to reduce the criticality of the CVC. A possible alternative is to use a restrictive resistance in the cathode. However, this increases the heat losses and thus decreases assembly efficiency. The results of experimental studies of the structure showing the saturation of photoemission current component with an increase in operating voltage. This fact suggests the existence of an effective mechanism for control of emission at constant operating voltage. This is fundamentally important for the stabilization of field emission cathode, providing a reliability and durability. The single-photon processes and the small thickness DLC films (15-20 nm) provide high-speed process of control.
机译:示出了高平均电流密度为0.1-0.3a·cm〜(-2)的现场发射电流源概念的实际实施结果。在技​​术真空条件下实现了6000小时水平的阴极样品的耐久性。建议一种现象学模型,其描述了从静电场的浓度区域真空中的平衡和非平衡电子的隧道隧道。由于光电效应的连接机理,作为发射电流的发射电流的增加,讨论了条件是热力学良好的,这不是局部发射区温度的不希望的增加。结果表明,为了确保阴极的稳定性和耐久性也很重要,以限制使用复合结构的平衡载体的浓度ΔDLC薄膜。“这有助于降低CVC的临界性。可能的替代方案是使用阴极中的限制性阻力。然而,这增加了热损失,从而降低了装配效率。结构的实验研究结果表明光电电流分量的饱和度随工作电压的增加。这一事实表明存在有效机制的存在为了控制恒定工作电压下的发射。这对于稳定场发射阴极来说是根本的重要性,提供可靠性和耐用性。单光子工艺和小厚度DLC膜(15-20nm)提供高速过程控制。

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